Etching txheej txheem ntws

1. Base tu

Ultrasonic tu, kua qaub / alkali daws kev kho mob (xws li RCA tu thiab lwm txoj hauv kev los tshem tawm cov kuab paug nyob saum npoo av (roj, txheej, oxide txheej).

2. Photoresist Txheej

Tig txheej txheej los ua cov txheej txheem niaj hnub photoresist txheej, ua ntej los tshem cov kuab tshuaj, thiab txhim kho adhesion.

3. Raug thiab Kev Loj Hlob

Raug: Siv daim npog qhov ncauj rau Irradiolet lub teeb, lossis loj ultraviolet teeb pom kev zoo rau cov duab thaij duab hauv photoresist.

Kev loj hlob: yaj cov chaw (zoo gel) lossis thaj chaw uas tsis pom kev) nrog kev daws teeb meem kom ua rau thaj chaw uas yuav tsum tau etched.

4. Etching

Ntub etching: imberse lub substrate nyob rau hauv ib etching daws los yog kho nws los ntawm txau.

Qhuav etching: ib qho roj ua cua (xws li cl ₂, cf ₄) tau qhia rau hauv lub tshuab nqus tsev kom tus mob ntshav siab rau etching.

5. Tshem tawm cov photoresist stripping

Wet gelatinization: Use solvents such as acetone, N-methylpyrrolidone (NMP), or strong acids/oxidants (such as H ₂ SO ₄+H ₂ O ₂).

Cov gelatin qhuav: oxygen Plasma ashing, ua tau zoo thiab seem nyob ywj pheej.

6. Kev Ua Haujlwm & Kev Tshuaj Xyuas

Kev ntxuav tu: Tshem tawm etching los ntawm cov khoom lag luam thiab cov khoom seem uas seem.

Nrhiav tau: Txheeb xyuas nws cov morphology, ntsuas nws qhov loj me, thiab kev kuaj hluav taws xob ntawm hluav taws xob.